Photolithography: a New Tool for Ceramic Science
نویسندگان
چکیده
منابع مشابه
Inorganic polymer photoresist for direct ceramic patterning by photolithography.
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
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ژورنال
عنوان ژورنال: MRS Proceedings
سال: 1989
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-155-293